LPP-EUV Light Source Development for High Volume Manufacturing Lithography

By Hakaru Mizoguchi, Junichi Fujimoto and Takashi Saitou EUV Source System We have developed a prototype of the first HVM EUV light source having 100 kHz 20 kW CO2 laser, 20 mm in diameter droplet generator, and magnetic field debris mitigation (Fig. 1).

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