By Hakaru Mizoguchi, Junichi Fujimoto and Takashi Saitou
EUV Source System
We have developed a prototype of the first HVM EUV light source having 100 kHz 20 kW CO2 laser, 20 mm in diameter droplet generator, and magnetic field debris mitigation (Fig. 1).
Fig. 1: GL200E HVM EUV Source Device