Tag Archives: Ultrafast Laser Pulses

Amplitude announces the acquisition of Fastlite

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Bordeaux, France – 19 décembre 2022. Amplitude, a leading manufacturer of ultrafast lasers, announces the acquisition of Fastlite, a French high-technology company specializing in ultrafast pulse shaping, characterization, and optical parametric amplifiers. The acquisition is expected to be completed in early 2023, pending regulatory consultations and approvals.

Amplitude and Fastlite have long-established ties and have worked together to bring advanced ultrafast technology to the market.

” We have worked with the Fastlite team for many years, and it is an honor to have them join the Amplitude family. The complementary expertise of the two companies will enable Amplitude to design and manufacture the next generation of ultrafast lasers.” says Eric Mottay, President, and C.E.O.

“ Fastlite shares the same passion for ultrafast laser technology as Amplitude, and I am looking forward to our teams working together. Amplitude’s world largest ultrafast laser portfolio constitutes an invaluable asset towards the offering of Ytterbium pumped OPA and OPCPA products and solutions. ” explains Pascal Tournois, CEO.

More information about Amplitude:
Amplitude is the international specialist and leader in femtosecond lasers for industrial, medical, and scientific applications. Combining research & innovation with industrial efficiency, Amplitude delivers advanced and reliable femtosecond lasers to a worldwide customer base. With Amplitude manufacturing sites and extensive support and application development facilities in Europe, Asia, and north America, Amplitude is committed to expand laser applications through product quality and proximity with its partners and customers.

More information about Fastlite:
Fastlite is a recognized leader in ultrafast scientific instrumentation and has since 2016 offered to the ultrafast scientific community customized ultrafast laser sources based on Ytterbium-pumped Optical Parametric Chirped Pulse Amplifiers.

Press contact:
Agnès BUYS MAULEON – Global Communication Manager
agnes.mauleon[a]amplitude-laser.com

Welding Characteristics of Foturan Glass Using Ultrashort Laser Pulses

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By Isamu Miyamoto, Yasuhiro Okamoto, Kristian Cvecek, Michael Schmidt, Henry Helvajian

While glass is widely used in different industrial field due to its excellent physical and chemical properties, there exist no reliable joining procedures of glass at the moment. We have developed a novel fusion welding procedure of glass that can weld glass even with high coefficient of thermal expansion (CTE) using ultrashort laser pulse (USLP).

Recently, ultrashort laser pulse (USLP) has brought a new wave of laser welding that enables crack-free welding of dielectric material like glass without pre- and post-heating. The advantages of USLP welding of glass are provided by embedded molten pool due to the unique laser absorption mechanism of nonlinear process. It has been shown that the stress due to the thermal shrinkage of the weld bead can be in principle prevented in USLP welding of glass where molten pool is embedded in bulk glass. The embedded molten pool also provides advantage of local melting selectively only at the joint interface. Continue reading →

Novel Processes in Laser Micro-fabrication and Micro-joining

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By: Kazuyoshi Itoh, YasuyukiOzeki

Department of Material and Life Science, Osaka University

Focused ultrafast laser pulses can cause a variety of the structural modifications including void, damage, refractive index (RI) change, and crack, depending on materials and irradiation conditions such as pulse energy, pulse width and numerical aperture (NA) of the focusing lens. Among these modifications, the RI change is interesting especially for the application to micro-fabrication of 3D photonic devices inside glass. The RI change occurs as a result of localized melting and rapid re-solidification. Fused silica shows positive RI change, allowing us to fabricate waveguides in glass. Other devices such as diffractive optical elements (DOE’s) can be fabricated regardless of the sign of RI change. We review this technique focusing on the fabrication of photonic devices (see Fig. 1).

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